國際標準(ISO)

  • ISO 10648-1:1997 -密封箱室--第1部分:設計原則
    Containment enclosures -- Part 1: Design principles

  • ISO 10648-2:1994 -密封箱室--第2部分:密封性分級及其檢驗方法
    Containment enclosures -- Part 2: Classification according to leak tightness and associated checking methods

  • ISO 10810:2010 -表面化學分析--X射線光電子能譜法--分析指南
    Surface chemical analysis -- X-ray photoelectron spectroscopy -- Guidelines for analysis

  • ISO 10991:2009 -微加工工程--詞彙
    Micro process engineering -- Vocabulary

  • ISO 11039:2012 -表面化學分析 - 掃描探針顯微鏡 - 測量漂移率
    Surface chemical analysis -- Scanning-probe microscopy -- Measurement of drift rate

  • ISO 11505:2012 -表面化學分析 - 一般程序進行定量成分深度剖析用輝光放電發射光譜法
    Surface chemical analysis -- General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry

  • ISO 11938:2012 -微束分析 - 電子探針微區分析 - 採用波長色散光譜方法元素定位分析
    Microbeam analysis -- Electron probe microanalysis -- Methods for elemental-mapping analysis using wavelength-dispersive spectroscopy

  • ISO 12406:2010 -表面化學分析--次級離子質譜法--深度剖析砷矽
    Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of arsenic in silicon

  • ISO 12772:1997 -實驗室玻璃器皿--拋棄式微量血球容量計毛細管
    Laboratory glassware -- Disposable microhaematocrit capillary tubes

  • ISO 13067:2011 -微束分析 - 電子背散射衍射 - 測量的平均晶粒尺寸
    Microbeam analysis -- Electron backscatter diffraction -- Measurement of average grain size

  • ISO 13084:2011 -表面化學分析 - 二次離子質譜分析法 - 校準質量刻度為飛行時間的二次離子質譜儀
    Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer

  • ISO 13130:2011 -實驗室玻璃器皿 - 乾燥器
    Laboratory glassware -- Desiccators

  • ISO 13132:2011 -實驗室玻璃器皿 - 培養皿
    Laboratory glassware -- Petri dishes

  • ISO 13424:2013 -表面化學分析 - X射線光電子能譜 - 薄膜分析結果的報告
    Surface chemical analysis -- X-ray photoelectron spectroscopy -- Reporting of results of thin-film analysis

  • ISO 1392:1977 -結晶點的測定--通用方法
    Determination of crystallizing point -- General method

  • ISO 14237:2010 -表面化學分析--二次離子質譜--用均勻摻雜物質測定矽中硼的原子濃度
    Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials

  • ISO 14594:2003 -微光束分析--電子微探分析--波長色散光譜學用實驗參數測定指南
    Microbeam analysis -- Electron probe microanalysis -- Guidelines for the determination of experimental parameters for wavelength dispersive spectroscopy

  • ISO 14594:2003/Cor 1:2009 -

  • ISO 14595:2003 -微光束分析--電子微探分析--檢定標樣(CRMs)的規範指南
    Microbeam analysis -- Electron probe microanalysis -- Guidelines for the specification of certified reference materials (CRMs)

  • ISO 14595:2003/Cor 1:2005 -

  • ISO 14606:2000 -表面化學分析--濺噴深度剖面圖--使用層狀結構作參考材料的優選技術
    Surface chemical analysis -- Sputter depth profiling -- Optimization using layered systems as reference materials

  • ISO 14701:2011 -表面化學分析 - X-射線光電子能譜法 - 測量的氧化矽厚度
    Surface chemical analysis -- X-ray photoelectron spectroscopy -- Measurement of silicon oxide thickness

  • ISO 14706:2000 -表面化學分析--用總反射X-射線螢光(TXRF)測定法測定矽晶片的表面基本的污染
    Surface chemical analysis -- Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

  • ISO 14707:2000 -表面化學分析--輝光釋放光傳播光譜測定法(GD-OES)--使用說明
    Surface chemical analysis -- Glow discharge optical emission spectrometry (GD-OES) -- Introduction to use

  • ISO 14912:2003 -氣體分析--氣體混合成份資料的轉換
    Gas analysis -- Conversion of gas mixture composition data

  • ISO 14912:2003/Cor 1:2006 -

  • ISO 14975:2000 -表面化學分析--資訊格式
    Surface chemical analysis -- Information formats

  • ISO 14976:1998 -表面化學分析--資料傳輸格式
    Surface chemical analysis -- Data transfer format

  • ISO 15470:2004 -表面化學分析--X射線光電子能譜法--選定的儀器性能參數的描述
    Surface chemical analysis -- X-ray photoelectron spectroscopy -- Description of selected instrumental performance parameters

  • ISO 15471:2004 -表面化學分析--螺旋電子光譜法--選定的儀器性能參數的描述
    Surface chemical analysis -- Auger electron spectroscopy -- Description of selected instrumental performance parameters

  • ISO 15472:2010 -表面化學分析--X射線光電子能譜法--校準能量標尺
    Surface chemical analysis -- X-ray photoelectron spectrometers -- Calibration of energy scales

  • ISO 15632:2012 -微束分析 - 能量色散型X射線光譜儀用於在電子探針顯微分析使用說明書和檢查選定的儀器性能參數的
    Microbeam analysis -- Selected instrumental performance parameters for the specification and checking of energy-dispersive X-ray spectrometers for use in electron probe microanalysis

  • ISO 15796:2005 -氣體分析--分析偏差的調查和處理
    Gas analysis -- Investigation and treatment of analytical bias

  • ISO 16129:2012 -表面化學分析 - X-射線光電子能譜法 - 用於評估的X-射線光電子能譜儀的一天到一天的性能的程序
    Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer

  • ISO 16242:2011 -表面化學分析 - 錄製和俄歇電子能譜報告數據(AES)
    Surface chemical analysis -- Recording and reporting data in Auger electron spectroscopy (AES)

  • ISO 16243:2011 -表面化學分析 - 錄製和X射線光電子能譜報告數據(XPS)
    Surface chemical analysis -- Recording and reporting data in X-ray photoelectron spectroscopy (XPS)

  • ISO 16413:2013 -評價厚度,密度和薄膜用X射線反射界面寬度 - 器樂要求,調整和定位,數據採集,數據分析和報告
    Evaluation of thickness, density and interface width of thin films by X-ray reflectometry -- Instrumental requirements, alignment and positioning, data collection, data analysis and reporting

  • ISO 16531:2013 -表面化學分析 - 深度分析 - 方法離子束對準和電流或電流密度的深度剖析中的AES和XPS的相關測量
    Surface chemical analysis -- Depth profiling -- Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

  • ISO 16592:2012 -微束分析 - 電子探針微區分析 - 使用準則的校準曲線法測定鋼中碳含量
    Microbeam analysis -- Electron probe microanalysis -- Guidelines for determining the carbon content of steels using a calibration curve method

  • ISO 16664:2004 -氣體分析--校正氣體和氣體混合物的處理--指南
    Gas analysis -- Handling of calibration gases and gas mixtures -- Guidelines

  • ISO 16962:2005 -表面化學分析--用輝光放電光發射光譜測定法分析鋅和/或鋁基金屬塗層
    Surface chemical analysis -- Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry

  • ISO 17331:2004 -表面化學分析--從矽片工作基準材料表面採集元素的化學方法及其全反射X射線螢光光譜法的測定
    Surface chemical analysis -- Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy

  • ISO 17331:2004/Amd 1:2010 -

  • ISO 17470:2004 -微光束分析--電子微探分析--波長分散X射線光譜法分析品質點的指南
    Microbeam analysis -- Electron probe microanalysis -- Guidelines for qualitative point analysis by wavelength dispersive X-ray spectrometry

  • ISO 17560:2002 -表面化學分析--次級離子質譜法--矽中硼的深仿形方法
    Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon

  • ISO 1772:1975 -實驗室用瓷坩堝和石英坩堝
    Laboratory crucibles in porcelain and silica

  • ISO 1773:1997 -實驗室玻璃器皿--細頸燒瓶
    Laboratory glassware -- Narrow-necked boiling flasks

  • ISO 1775:1975 -實驗室瓷質儀器--要求和測試方法
    Porcelain laboratory apparatus -- Requirements and methods of test

  • ISO 17973:2002 -表面化學分析--中解析度螺旋電子光譜儀--元素分析用能量標度的校準
    Surface chemical analysis -- Medium-resolution Auger electron spectrometers -- Calibration of energy scales for elemental analysis

  • ISO 17974:2002 -表面化學分析--高解析度螺旋電子光譜儀--元素和化學狀態分析用能量標度的校準
    Surface chemical analysis -- High-resolution Auger electron spectrometers -- Calibration of energy scales for elemental and chemical-state analysis

  • ISO 18114:2003 -表面化學分析--次級離子質譜法--測定離子注入標樣中的相對靈敏度係數
    Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials

  • ISO 18115-1:2013 -表面化學分析 - 詞彙 - 第1部分:光譜法用的一般術語和術語
    Surface chemical analysis -- Vocabulary -- Part 1: General terms and terms used in spectroscopy

  • ISO 18115-2:2013 -表面化學分析 - 詞彙 - 第2部分:在掃描探針顯微鏡使用條款
    Surface chemical analysis -- Vocabulary -- Part 2: Terms used in scanning-probe microscopy

  • ISO 18116:2005 -表面化學分析--分析用試樣的製備和裝配指南
    Surface chemical analysis -- Guidelines for preparation and mounting of specimens for analysis

  • ISO 18117:2009 -表面化學分析--樣品處理前分析
    Surface chemical analysis -- Handling of specimens prior to analysis

  • ISO 18118:2004 -表面化學分析--螺旋電子光譜法和X射線光電子光譜法--同質材料定量分析用實驗室測定相對敏感性因數的使用指南
    Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

  • ISO 18516:2006 -表面化學分析--螺旋電子光譜法和X射線光電子光譜法--橫向解析度測定
    Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Determination of lateral resolution

  • ISO 19318:2004 -表面化學分析--X射線光電子能譜法--電荷控制和電荷校正方法的報告
    Surface chemical analysis -- X-ray photoelectron spectroscopy -- Reporting of methods used for charge control and charge correction

  • ISO 20341:2003 -表面化學分析--次級離子質譜法--多δ層標準材料深度溶解參數的估算方法
    Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for estimating depth resolution parameters with multiple delta-layer reference materials

  • ISO 20903:2011 -表面化學分析 - 俄歇電子能譜和X射線光電子能譜 - 報告結果時用於確定所需的峰值強度和方法的信息
    Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Methods used to determine peak intensities and information required when reporting results

  • ISO 21079-1:2008 -包含氧化鋁、氧化鋯和矽石的耐火材料化學分析--包含5%- 45%ZrO的耐火材料(可選擇X射線螢光法)--第1
    Chemical analysis of refractories containing alumina, zirconia and silica -- Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) -- Part 1: Apparatus, reagents and dissolution

  • ISO 21079-2:2008 -包含氧化鋁、氧化鋯和矽石的耐火材料化學分析--包含5%- 45%ZrO的耐火材料(可選擇X射線螢光法)--第2
    Chemical analysis of refractories containing alumina, zirconia, and silica -- Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) -- Part 2: Wet chemical analysis

  • ISO 21079-3:2008 -包含氧化鋁、氧化鋯和矽石的耐火材料化學分析--包含5%- 45%ZrO的耐火材料(可選擇X射線螢光法)--第3
    Chemical analysis of refractories containing alumina, zirconia, and silica -- Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) -- Part 3: Flame atomic absorption spectrophotometry (FAAS) and inductively coupled plasma emission spectrometry (ICP -AES)

  • ISO 21270:2004 -表面化學分析--X射線光電子能譜法和螺旋電子光譜法--強度標的線性度
    Surface chemical analysis -- X-ray photoelectron and Auger electron spectrometers -- Linearity of intensity scale

  • ISO 22029:2012 -微束分析 - EMSA/ MAS光譜數據交換標準文件格式
    Microbeam analysis -- EMSA/MAS standard file format for spectral-data exchange

  • ISO 22048:2004 -表面化學分析--靜態次生離子質譜法的資訊格式
    Surface chemical analysis -- Information format for static secondary-ion mass spectrometry

  • ISO 2211:1973 -液態化學品--哈森單位(鉑-鈷標度)色度測定
    Liquid chemical products -- Measurement of colour in Hazen units (platinum-cobalt scale)

  • ISO 22309:2011 -微束分析 - 用能量分散光譜儀(EDS)與11原子序數(鈉)或以上元素的定量分析
    Microbeam analysis -- Quantitative analysis using energy-dispersive spectrometry (EDS) for elements with an atomic number of 11 (Na) or above

  • ISO 22489:2006 -微光束分析--電子微探分析--運用波長色散X射線光譜測量法定量分析塊狀樣品
    Microbeam analysis -- Electron probe microanalysis -- Quantitative point analysis for bulk specimens using wavelength-dispersive X-ray spectroscopy

  • ISO 23812:2009 -表面化學分析--次級離子質譜法-- 多δ層參考物質評估深度法
    Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials

  • ISO 23830:2008 -表面化學分析--次級離子質譜法--靜態次級離子質譜測定法中相對強度數值範圍的重複性和穩定性
    Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry

  • ISO 23833:2013 -微束分析 - 電子探針(EPMA) - 詞彙
    Microbeam analysis -- Electron probe microanalysis (EPMA) -- Vocabulary

  • ISO 24173:2009 -微光束分析--電子背散射衍射取向測定方法指南
    Microbeam analysis -- Guidelines for orientation measurement using electron backscatter diffraction

  • ISO 24236:2005 -表面化學分析--螺旋電子光譜法--強度標的重複性和持久性
    Surface chemical analysis -- Auger electron spectroscopy -- Repeatability and constancy of intensity scale

  • ISO 24237:2005 -表面化學分析--X射線光電子能譜法--強度的可重複性和穩定性
    Surface chemical analysis -- X-ray photoelectron spectroscopy -- Repeatability and constancy of intensity scale

  • ISO 24450:2005 -實驗室玻璃器皿--廣口長頸燒瓶
    Laboratory glassware -- Wide-necked boiling flasks

  • ISO 25498:2010 -微光束分析--電子顯微鏡分析--選區電子衍射分析中的應用透射電子顯微鏡
    Microbeam analysis -- Analytical electron microscopy -- Selected-area electron diffraction analysis using a transmission electron microscope

  • ISO 2590:1973 -測定砷的一般方法--二乙基二硫代氨基甲酸銀光度法
    General method for the determination of arsenic -- Silver diethyldithiocarbamate photometric method

  • ISO 2718:1974 -氣相色譜化學分析法標準編制
    Standard layout for a method of chemical analysis by gas chromatography

  • ISO 27911:2011 -表面化學分析 - 掃描探針顯微鏡 - 定義和近場光學顯微鏡的橫向分辨率的校準
    Surface chemical analysis -- Scanning-probe microscopy -- Definition and calibration of the lateral resolution of a near-field optical microscope

  • ISO 28600:2011 -表面化學分析 - 掃描探針顯微鏡的數據傳輸格式
    Surface chemical analysis -- Data transfer format for scanning-probe microscopy

  • ISO 29081:2010 -表面化學分析--螺旋電子光譜法--電荷控制和電荷校正方法報告
    Surface chemical analysis -- Auger electron spectroscopy -- Reporting of methods used for charge control and charge correction

  • ISO 3165:1976 -工業用化學品取樣--取樣的安全性
    Sampling of chemical products for industrial use -- Safety in sampling

  • ISO 3696:1987 -水分析實驗室使用--規範和測試方法
    Water for analytical laboratory use -- Specification and test methods

  • ISO 383:1976 -實驗室玻璃器皿--互換性錐形磨介面
    Laboratory glassware -- Interchangeable conical ground joints

  • ISO 4142:2002 -實驗室玻璃器皿--試管
    Laboratory glassware -- Test tubes

  • ISO 4785:1997 -實驗室玻璃器皿--通用直孔玻璃活栓
    Laboratory glassware -- Straight-bore glass stopcocks for general purposes

  • ISO 4790:1992 -玻璃和玻璃之間的封接--應力的測定
    Glass-to-glass sealings -- Determination of stresses

  • ISO 4791-1:1985 -實驗室儀器--玻璃、瓷器或透明石英製品儀器的基本詞彙--第1部分:儀器名稱
    Laboratory apparatus -- Vocabulary relating to apparatus made essentially from glass, porcelain or vitreous silica -- Part 1: Names for items of apparatus

  • ISO 4793:1980 -實驗室燒結(多孔)篩檢程序--孔隙度、分類和命名
    Laboratory sintered (fritted) filters -- Porosity grading, classification and designation

  • ISO 4794:1982 -實驗室玻璃器皿--顏色代碼和顏色標誌用色釉的化學穩定性測定方法
    Laboratory glassware -- Methods for assessing the chemical resistance of enamels used for colour coding and colour marking

  • ISO 4796-1:2000 -實驗室玻璃器皿--瓶--第1部分:螺紋口瓶
    Laboratory glassware -- Bottles -- Part 1: Screw-neck bottles

  • ISO 4796-2:2000 -實驗室玻璃器皿--瓶--第2部分:錐形口瓶
    Laboratory glassware -- Bottles -- Part 2: Conical neck bottles

  • ISO 4796-3:2000 -實驗室玻璃器皿--瓶--第3部分:吸氣瓶
    Laboratory glassware -- Bottles -- Part 3: Aspirator bottles

  • ISO 4797:2004 -實驗室玻璃器皿--錐形磨介面燒瓶
    Laboratory glassware -- Boiling flasks with conical ground joints

  • ISO 4798:1997 -實驗室玻璃器皿--過濾漏斗
    Laboratory glassware -- Filter funnels

  • ISO 4799:1978 -實驗室玻璃器皿--冷凝器
    Laboratory glassware -- Condensers

  • ISO 4800:1998 -實驗室玻璃器皿--分液漏斗和滴液漏斗
    Laboratory glassware -- Separating funnels and dropping funnels

  • ISO 4802-1:2010 -玻璃器皿--玻璃容器內表面的耐水性--第1部分:用滴定法測定及分類
    Glassware -- Hydrolytic resistance of the interior surfaces of glass containers -- Part 1: Determination by titration method and classification

  • ISO 4802-2:2010 -玻璃器皿--玻璃容器內表面的耐水性--第2部分:火焰光譜法測定和分類
    Glassware -- Hydrolytic resistance of the interior surfaces of glass containers -- Part 2: Determination by flame spectrometry and classification

  • ISO 4803:1978 -實驗室玻璃器皿--硼矽酸鹽玻璃管
    Laboratory glassware -- Borosilicate glass tubing

  • ISO 5790:1979 -工業用無機化學品--測定氯化物含量的一般方法--汞量法
    Inorganic chemical products for industrial use -- General method for determination of chloride content -- Mercurimetric method

  • ISO 6141:2000 -氣體分析--標定氣體和混合氣體合格證書要求
    Gas analysis -- Requirements for certificates for calibration gases and gas mixtures

  • ISO 6142:2001 -氣體分析--標定用混合氣體的製備--稱重法
    Gas analysis -- Preparation of calibration gas mixtures -- Gravimetric method

  • ISO 6142:2001/Amd 1:2009 -液體進樣
    Liquid introduction

  • ISO 6143:2001 -氣體分析--測定並檢查標定用混合氣體成分的比較方法
    Gas analysis -- Comparison methods for determining and checking the composition of calibration gas mixtures

  • ISO 6144:2003 -氣體分析--標定用混合氣體的製備--靜態容量法
    Gas analysis -- Preparation of calibration gas mixtures -- Static volumetric method

  • ISO 6145-10:2002 -氣體分析--動態容量法製備標定用氣體混合物--第10部分:滲透法
    Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 10: Permeation method

  • ISO 6145-11:2005 -氣體分析--動態容量法製備標定用氣體混合物--第11部分:電化學生成法
    Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 11: Electrochemical generation

  • ISO 6145-1:2003 -氣體分析--動態容量法製備標定用氣體混合物--第1部分:校正方法
    Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 1: Methods of calibration

  • ISO 6145-2:2001 -氣體分析--動態容量法製備標定用氣體混合物--第2部分:容量泵
    Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 2: Volumetric pumps

  • ISO 6145-4:2004 -氣體分析--動態容量法製備標定用氣體混合物--第4部分:持續噴射器注入法
    Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 4: Continuous syringe injection method

  • ISO 6145-5:2009 -氣體分析--動態容量法製備標定用氣體混合物--第2部分:毛細管校準設備
    Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 5: Capillary calibration devices

  • ISO 6145-6:2003 -氣體分析--動態容量法製備標定用氣體混合物--第6部分:臨界聲孔
    Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 6: Critical orifices

  • ISO 6145-7:2009 -氣體分析--動態容量法製備標定用氣體混合物--第7部分:熱式質量流量控制器
    Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 7: Thermal mass-flow controllers

  • ISO 6145-8:2005 -氣體分析--動態容量法製備標定用氣體混合物--第8部分:擴散法
    Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 8: Diffusion method

  • ISO 6145-9:2009 -氣體分析--動態容量法製備標定用氣體混合物--第9部分:飽和度法
    Gas analysis -- Preparation of calibration gas mixtures using dynamic volumetric methods -- Part 9: Saturation method

  • ISO 6206:1979 -工業用化學品--採樣--詞彙
    Chemical products for industrial use -- Sampling -- Vocabulary

  • ISO 6227:1982 -工業用化學品--測定氯離子用一般方法--電位滴定法
    Chemical products for industrial use -- General method for determination of chloride ions -- Potentiometric method

  • ISO 6228:1980 -工業用化學品--通過還原和滴定分析法測定微量硫化合物(如硫酸鹽)的一般方法
    Chemical products for industrial use -- General method for determination of traces of sulphur compounds, as sulphate, by reduction and titrimetry

  • ISO 6286:1982 -分子吸收光譜法--詞彙--總則--儀器
    Molecular absorption spectrometry -- Vocabulary -- General -- Apparatus

  • ISO 6353-1:1982 -化學分析試劑--第1部分:一般測試方法
    Reagents for chemical analysis -- Part 1: General test methods

  • ISO 6353-2:1983 -化學分析試劑--第2部分:規範--第一系列
    Reagents for chemical analysis -- Part 2: Specifications -- First series

  • ISO 6353-2:1983/Add 2:1986 -

  • ISO 6353-3:1987 -化學分析試劑--第3部分:規範--第二系列
    Reagents for chemical analysis -- Part 3: Specifications -- Second series

  • ISO 6382:1981 -測定矽含量的一般方法--還原矽鉬酸鹽分光光度法
    General method for determination of silicon content -- Reduced molybdosilicate spectrophotometric method

  • ISO 641:1975 -實驗室玻璃器皿--互換性球形磨介面
    Laboratory glassware -- Interchangeable spherical ground joints

  • ISO 6556:2012 -實驗室玻璃器皿 - 過濾瓶
    Laboratory glassware -- Filter flasks

  • ISO 6685:1982 -工業用化學品--測定鐵含量的一般方法--1,10-菲羅?分光光度法
    Chemical products for industrial use -- General method for determination of iron content -- 1,10-Phenanthroline spectrophotometric method

  • ISO 6955:1982 -分析光譜法--火焰發射、原子吸收和原子螢光法--詞彙
    Analytical spectroscopic methods -- Flame emission, atomic absorption, and atomic fluorescence -- Vocabulary

  • ISO 7057:1981 -實驗室塑料器皿--過濾漏斗
    Plastics laboratory ware -- Filter funnels

  • ISO 718:1990 -實驗室玻璃器皿--熱衝擊和熱衝擊強度--測試方法
    Laboratory glassware -- Thermal shock and thermal shock endurance -- Test methods

  • ISO 7504:2001 -氣體分析--詞彙
    Gas analysis -- Vocabulary

  • ISO 758:1976 -工業用液態化學品--20℃時的密度測定
    Liquid chemical products for industrial use -- Determination of density at 20 degrees C

  • ISO 759:1981 -工業用揮發性有機液體--水浴蒸發後乾殘餘物的測定--一般方法
    Volatile organic liquids for industrial use -- Determination of dry residue after evaporation on water bath -- General method

  • ISO 760:1978 -水的測定--卡爾·費休法(通用方法)
    Determination of water -- Karl Fischer method (General method)

  • ISO 78-2:1999 -化學--標準的格式--第2部分:化學分析方法
    Chemistry -- Layouts for standards -- Part 2: Methods of chemical analysis

  • ISO 78-3:1983 -化學--標準的格式--第3部分:分子吸收光譜法標準
    Chemistry -- Layouts for standards -- Part 3: Standard for molecular absorption spectrometry

  • ISO 78-4:1983 -標準的格式--第4部分:原子吸收光譜分析的標準
    Layouts for standards -- Part 4: Standard for atomic absorption spectrometric analysis

  • ISO 8213:1986 -工業用化學品--取樣技術--固體化工產品的形式從不同的粒子粗粉末腫塊
    Chemical products for industrial use -- Sampling techniques -- Solid chemical products in the form of particles varying from powders to coarse lumps

  • ISO 918:1983 -工業用揮發性有機液體--蒸餾特性的測定
    Volatile organic liquids for industrial use -- Determination of distillation characteristics

  • ISO Guide 30:1992 -與標準物質有關的術語和定義
    Terms and definitions used in connection with reference materials

  • ISO Guide 30:1992/Amd 1:2008 -參考物質定義修正與參考物質之驗證
    Revision of definitions for reference material and certified reference material

  • ISO Guide 31:2000 -參考材料--證書和標籤內容
    Reference materials -- Contents of certificates and labels

  • ISO Guide 32:1997 -認證參考資料的使用和分析化學的校正
    Calibration in analytical chemistry and use of certified reference materials

  • ISO Guide 33:2000 -已認證標準物質的使用
    Uses of certified reference materials

  • ISO Guide 34:2009 -參考物質生產機構一般要求
    General requirements for the competence of reference material producers

  • ISO Guide 35:2006 -參考材料--一般原則和統計認證
    Reference materials -- General and statistical principles for certification

  • ISO/CD 17109 -表面化學分析 - 深度分析 - 一種用於X射線光電子能譜濺射速率測定方法,採用多層薄膜的俄歇電子能譜和二次離子質譜分析濺射深度剖析
    Surface chemical analysis -- Depth profiling -- A method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using multi-layer thin films

  • ISO/CD 18337 -表面化學分析 - 測量的共焦熒光顯微鏡的橫向分辨率
    Surface chemical analysis -- Measurement of lateral resolution of confocal fluorescence microscope

  • ISO/CD 4797 -實驗室玻璃器皿 - 沸騰燒瓶,錐形磨口接頭
    Laboratory glassware -- Boiling flasks with conical ground joints

  • ISO/CD 6142-1 -氣體分析 - 製備校準用混合氣體 - 第1部分:I類混合物重量法
    Gas analysis -- Preparation of calibration gas mixtures -- Part 1: Gravimetric method for Class I mixtures

  • ISO/CD Guide 31 -參考材料 - 證書和隨附文件的內容
    Reference materials -- Contents of certificates and accompanying documentation

  • ISO/CD Guide 33 -參考材料 - 良好的實踐使用的參考材料
    Reference Materials -- Good practice in using reference materials

  • ISO/DGuide 30 -參考材料 - 精選術語和定義
    Reference materials -- Selected terms and definitions

  • ISO/DGuide 80 -指導內部製劑質量控制的參考材料
    Guidance for in-house preparation of reference materials for quality control

  • ISO/DIS 11775 -表面化學分析 - 掃描探針顯微鏡 - 測定正常懸臂彈簧常數
    Surface chemical analysis -- Scanning-probe microscopy -- Determination of cantilever normal spring constants

  • ISO/DIS 11952 -表面化學分析 - 掃描探針顯微鏡 - 幾何量使用SPM的測定:測量系統的校準
    Surface chemical analysis -- Scanning-probe microscopy -- Determination of geometric quantities using SPM: Calibration of measuring systems

  • ISO/DIS 13083 -表面化學分析 - 掃描探針顯微鏡,標準對掃描的空間分辨率擴展電阻顯微鏡和掃描電容顯微鏡的定義和校準
    Surface chemical analysis - Scanning Probe Microscopy- Standards on the definition and calibration of spatial resolution of Scanning Spreading Resistance Microscopy and Scanning Capacitance Microscopy

  • ISO/DIS 13095 -表面化學分析 - 原子力顯微鏡 - 程序中用於測量納米結構的原子力顯微鏡探針柄輪廓原位表徵
    Surface Chemical Analysis -- Atomic force microscopy -- Procedure for in situ characterization of AFM probe shank profile used for nanostructure measurement

  • ISO/DIS 14606 -表面化學分析 - 濺射深度剖析 - 使用優化的分層系統作為參考材料
    Surface chemical analysis -- Sputter depth profiling -- Optimization using layered systems as reference materials

  • ISO/DIS 14706 -表面化學分析 - 表面污染元素的測定在矽片上用全反射X射線熒光(TXRF)光譜
    Surface chemical analysis -- Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

  • ISO/DIS 16496 -實驗室玻璃儀器 - 真空夾套容器的隔熱
    Laboratory glassware -- Vacuum-jacketed vessels for heat insulation

  • ISO/DIS 4796-1 -實驗室玻璃器皿 - 瓶 - 第1部分:螺紋頸瓶
    Laboratory glassware -- Bottles -- Part 1: Screw-neck bottles

  • ISO/DIS 6141 -氣體分析 - 證書進行校準氣體混合物的內容
    Gas analysis -- Contents of certificates for calibration gas mixtures

  • ISO/DIS 6145-2 -氣體分析 - 準備用動態方法校準用混合氣體 - 第2部分:活塞泵
    Gas analysis -- Preparation of calibration gas mixtures using dynamic methods -- Part 2: Piston pumps

  • ISO/DIS 7504 -氣體分析 - 詞彙
    Gas analysis -- Vocabulary

  • ISO/DTR 79 -參考材料進行定性分析 - 對標稱性能有證標準物質的例子
    Reference Materials for qualitative analysis -- Examples of reference materials certified for nominal properties

  • ISO/FDIS 17470 -微束分析 - 電子探針微區分析 - 指引用波長色散X射線光譜定性分析點
    Microbeam analysis -- Electron probe microanalysis -- Guidelines for qualitative point analysis by wavelength dispersive X-ray spectrometry

  • ISO/NP 17560 -表面化學分析 - 次級離子質譜 - 用於硼矽深度剖析方法
    Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon

  • ISO/PRF 17862 -表面化學分析 - 二次離子質譜 - 在飛行時間的單離子計數質量分析器線性強度規模
    Surface chemical analysis -- Secondary ion mass spectrometry -- Linearity of intensity scale in single ion counting time-of-flight mass analysers

  • ISO/TR 10989:2009 -參考材料--用於RM演算之分類指南和關鍵字
    Reference materials -- Guidance on, and keywords used for, RM categorization

  • ISO/TR 11773:2013 -參考資料全球分佈
    Global distribution of reference materials

  • ISO/TR 14187:2011 -表面化學分析 - 納米材料的表徵
    Surface chemical analysis -- Characterization of nanostructured materials

  • ISO/TR 15969:2001 -表面化學分析--深度剖面--濺射深度測量
    Surface chemical analysis -- Depth profiling -- Measurement of sputtered depth

  • ISO/TR 16268:2009 -表面化學分析--確保用離子注入產生的工作標準物質中保留面劑量的建議程序
    Surface chemical analysis -- Proposed procedure for certifying the retained areic dose in a working reference material produced by ion implantation

  • ISO/TR 18392:2005 -表面化學分析--X射線光電子能譜法--背景測定程序
    Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for determining backgrounds

  • ISO/TR 18394:2006 -表面化學分析--螺旋電子光譜法--化學資訊推導
    Surface chemical analysis -- Auger electron spectroscopy -- Derivation of chemical information

  • ISO/TR 19319:2013 -表面化學分析 - 基本的方法來測定的束為基礎的方法橫向分辨率和清晰度
    Surface chemical analysis -- Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods

  • ISO/TR 22335:2007 -表面化學分析--深度剖面--濺射速率測量:使用機械光針式輪廓儀的網眼複製法
    Surface chemical analysis -- Depth profiling -- Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer

  • ISO/TS 14167:2003 -氣體分析--校準混合氣體使用過程中的一般品質保證--指南
    Gas analysis -- General quality assurance aspects in the use of calibration gas mixtures - Guidelines

  • ISO/TS 15338:2009 -表面化學分析--輝光放電質譜測定法(GD-MS)--使用介紹
    Surface chemical analysis -- Glow discharge mass spectrometry (GD-MS) -- Introduction to use

  • ISO/TS 25138:2010 -表面化學分析--輝光放電光學放射光譜儀分析金屬氧化物薄膜
    Surface chemical analysis -- Analysis of metal oxide films by glow-discharge optical-emission spectrometry

  • ISO/TS 29041:2008 -氣體混合物--重量分析準備--控制成分的相關性
    Gas mixtures -- Gravimetric preparation -- Mastering correlations in composition

  • ISO/TS 29041:2008/Cor 1:2009 -

  • ISO/WD 14707 -表面化學分析 - 輝光放電發射光譜法(GD-OES) - 介紹使用
    Surface chemical analysis -- Glow discharge optical emission spectrometry (GD-OES) -- Introduction to use

  • ISO/WD 17980 -表面化學分析 - 表面表徵方法來衡量生物材料和相應的biointeractions的表面性質
    Surface chemical analysis -- Surface characterization methods to measure surface properties of biomaterials and corresponding biointeractions

  • ISO/WD 18516 -表面化學分析 - 確定在基礎梁的方法橫向分辨率和清晰度
    Surface chemical analysis -- Determination of lateral resolution and sharpness in beam based methods

  • ISO/WD 6145-6 -氣體分析 - 準備用動態方法校準用混合氣體 - 第6部分:關鍵竅
    Gas analysis -- Preparation of calibration gas mixtures using dynamic methods -- Part 6: Critical orifices

  • ISO/WD Guide 35 -參考材料 - 對屬性值的賦值的一般指導
    Reference materials -- General guidance for the value assignment of property values

  • ISO/WD TR 13096 -表面化學分析 - 掃描探針顯微鏡 - 指南的原子力顯微鏡探針特性的描述
    Surface chemical analysis -- Scanning-probe microscopy -- Guidelines for the description of AFM probe properties

  • ISO/WD TR 16476 -參考材料 - 建立並表示分配給參考的材料數量值的計量溯源性的現狀
    Reference materials -- Current status of establishing and expressing metrological traceability of quantity values assigned to reference materials

  • ISO/WD TS 18507 -表面化學分析 - 在生物和環境分析中的應用全反射X射線熒光光譜技術規範
    Surface Chemical Analysis - Technical Specification for the use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis


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